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Thomas West Inc.

CMP Products

TWI pads are used on all CMP tools

Polishing pads play a critical role in obtaining highly consistent and reliable Chemical Mechanical Planarization (CMP) process results. For ten years, TWI has developed and supplied CMP pads for all applications.

All Tools, All Major Manufacturing Centers

TWI pads are used for all CMP applications
TWI pads are used for all CMP applications

TWI pads are currently used in production in Taiwan, China, Korea, Singapore, Japan, Malaysia, Europe, Israel and the United States.

TWI pads are used on all major CMP tools including Applied Materials, Ebara, Speedfam-Ipec, Strasbaugh, Novellus, and Peter Wolters to produce virtually all types of integrated circuits including DRAM, flash and logic devices.

All TWI pads are manufactured in a sheet form which allows superior consistency within lot, and lot-to-lot.

TWI is one of only four pad manufacturers to be granted a license by Applied Materials for use of its patented window technology.

TWI routinely customizes pads for virtually any configuration of subpad, grooving, tool, size, and End Point Detection (EPD) capability.